Inelastic Electron Tunneling Spectroscopy Evaluation,

Abstract

An exploratory effort to determine the feasibility of studying the properties of an aluminum/oxide/adhesive interface using the method of inelastic electron tunneling was initiated in January of 1976. Prime purposes in this effort are to develop an understanding of the molecular nature of an adhesive bond, to relate the microscopic nature of the adhesive bond to macroscopic engineering bond properties, and to predict NDE tests that will yield bond strength parameters. An initial attempt was made to obtain data using less than optimal experimental conditions for the purpose of quickly establishing the feasibility of the method. This approach proved unsuccessful. Contamination from the vacuum/evaporator system and electronic noise dominated the signal from the adhesive whose properties we desired to study. Therefore we expended the majority of effort in construction, installation and testing of optimal electron tunneling facilities.

Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1976
Accession Number
ADP003011

Entities

People

  • T. Wolfram

Organizations

  • University of Missouri

Tags

DTIC Thesaurus Topics

  • Adhesives
  • Aluminum
  • Buildings And Structures
  • Construction
  • Contamination
  • Electrons
  • Engineering
  • Evaporators
  • Quantum Tunneling
  • Spectroscopy
  • Test And Evaluation
  • Tunneling

Fields of Study

  • Physics

Readers

  • Computational Modeling and Simulation
  • Structural Health Monitoring of Composite Structures.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics