Recent Advances in the Deposition of Ferroelectric Thin Films,
Abstract
Recent developments in ferroelectric thin film deposition involving plasma based approaches, are described, which include (a) multi-magnetron. sputter deposition, (b) Multi-ion-beam reactive sputter (MIBERS) deposition, (c) Pulsed excimer laser ablation and (d) ECR (Electron cyclotron resonance) plasma assisted deposition. These methods commonly prevailed intrinsic low energy ion bombardment during the growth process, which may be used for the control over composition, crystallization temperature and microstructure. A low energy (60 - 75 eV) ion bombardment of the ferroelectric Pb(Zr,Ti)03 thin films indicated a reduction in the phase formation/crystallization temperature, improved the electrical properties, microstructure and the surface smoothness. Discussion is presented emphasizing the effects of low energy bombardment in different deposition processes. Recent findings using rapid thermal annealing process are also described.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 05, 1991
- Accession Number
- ADP006639
Entities
People
- S. B. Krupanidhi
Organizations
- Pennsylvania State University