Liquid Source CVD,
Abstract
This work entails an investigation Of a new method for depositing complex thin films by, injecting stoichiometrically correct liquid sources into a vacuum chamber such that thin films are formed on silicon substrates at room temperature under closely controlled conditions.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 05, 1991
- Accession Number
- ADP006692
Entities
People
- C. A. Paz De Araujo
- J. Cuchiaro
- L. D. Mcmillan
- Teryn R. Roberts