Transport-Induced-Grating Interferometry;Application to Photorefractive Bi sub 12 Tio sub 20,

Abstract

We have developed a technique to measure interferometrically charge-transport-induced refractive index gratings in photoconductive insulators. All four parameters needed to describe fully the interaction between the two beams Bragg matched to the grating can be determined. We use the method to find that the complex optical polarizability of an occupied charge trap equals that of an unoccupied trap plus (0.7 - i4.5 + or - 0.7 + or - iO.4) x 10 to the -22nd cu.cm. in photorefractive Bi12TiO20. A spatially sinusoidal grating of optical intensity can produce a sinusoidal grating of occupied deep traps in photorefractive crystals. Under a wide variety of experimental conditions, a steady trap grating is produced, after sufficiently long times, that results in a change delta epsilon of the optical dielectric tensor of the form.

Document Details

Document Type
Technical Report
Publication Date
May 22, 1992
Accession Number
ADP006750

Entities

People

  • J. P. Partanen
  • Ping Xia
  • R. W. Hellwarth

Organizations

  • University of Southern California

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Advanced Materials
  • Dielectrics
  • Engineered Materials
  • Intensity
  • Interferometry
  • Massachusetts
  • Materials
  • Metamaterials
  • Optical Materials
  • Photorefractive Materials
  • Plasmonic Materials
  • Plasmonic Metamaterials
  • Refractive Index
  • Transport Ships

Fields of Study

  • Physics

Readers

  • Analytical Mechanics
  • Materials Science and Engineering.
  • Optical Physics and Photonics.

Technology Areas

  • Microelectronics