Design and Analysis of Multimirror Soft-X-Ray Projection Lithography Systems,
Abstract
A differential equation method has been developed for the design of soft x-ray projection lithography systems. This method yields numerical values for the sag and slope of two surfaces within a multi-mirror projection system such that the Abbe Sine condition and the constant optical path length condition are satisfied. Application of this design method to three- and four-mirror systems is in progress. Results are compared to optical performance of similar systems designed by conventional methods.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 22, 1992
- Accession Number
- ADP007231
Entities
People
- Cheng Wang
- David L. Shealy
Organizations
- University of Alabama