Illumination Requirements for Optical Projectors and How to Think about Them,

Abstract

A fundamental requirement of chip lithography is that patterns be imaged identically everywhere in the field. the illumination should be arranged to achieve this end by compensating, insofar as possible, for variations caused by the rest of the system. These includes variation of power/area, direction, polarization, and spectral distribution. The illumination should also be configured so that patterns are imaged the same way regardless of their orientations. Full telecentricity is achieved only if the illumination, as well as the imaging lens, is telecentric.

Document Details

Document Type
Technical Report
Publication Date
May 22, 1992
Accession Number
ADP007232

Entities

People

  • Douglas S. Goodman

Organizations

  • International Business Machines Corporation (Armonk, NY)

Tags

DTIC Thesaurus Topics

  • California
  • Illumination
  • Lithography
  • Orientation (Direction)
  • Photolithography
  • Polarization
  • Soft X Rays
  • X Rays

Fields of Study

  • Physics

Readers

  • Image Processing and Computer Vision.
  • Integrated Circuit Design and Technology.