Reflection Mask Technology for Soft-X-Ray Projection Lithography,

Abstract

Soft X-ray Projection Lithography (SXPL) may be used to fabricate high resolution structures for future integrated circuits. This technique will use a reflection mask which is a substrate coated with an x-ray multilayer mirror and patterned with a thin layer of x-ray absorber. Mask patterning processes must not degrade the reflectivity of the x-ray mirror and mask repair techniques must be developed.

Document Details

Document Type
Technical Report
Publication Date
May 22, 1992
Accession Number
ADP007237

Entities

People

  • A. M. Hawryluk
  • D. P. Gaines
  • D. W. Phillion
  • N. M. Ceglio
  • R. Browning

Organizations

  • Lawrence Livermore National Laboratory

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • High Resolution
  • Integrated Circuits
  • Lithography
  • Mirrors
  • Photolithography
  • Reflection
  • Reflectivity
  • Soft X Rays
  • X Rays

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.