Design of an Extended Image Field Soft-X-Ray Projection System,
Abstract
A soft x-ray projection system has been designed, consisting of all-reflectance multilayer optics. The design enables 0.1 micron resolution over a wide circular image field of 12.5 mm2. Optical systems for X-ray projection lithography use various normal-incidence geometries to realize sub-0.1 micron resolution with a depth of focus of 0.5 micron. To meet all other lithography imaging requirements, with respect to telecentricity, distortion, and image field size, the number of components in such a design can be as high as five, often including aspherical elements.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 22, 1992
- Accession Number
- ADP007238
Entities
People
- E. J. Puik
- E. Louis
- F. Bijkerk
- G. E. Van Dorssen
- H. -j. Voorma
Organizations
- Stichting voor Fundamenteel Onderzoek der Materie