Soft-X-Ray Projection Imaging Using a Laser Plasma Source,
Abstract
The feasibility of producing small feature sizes in resists using soft x-ray projection lithography has been demonstrated. Experiments by AT and T Bell Laboratories have achieved features small as 0.05 microns using a Schwarzschild objective and 140 angstrom radiation from an undulator at the National Synchrotron Light Source. We describe here a similar imaging system in which the illumination is derived from a high-fluence laser plasma source (LPS) of soft x-rays instead of a synchrotron radiation source. The laser plasma source has been shown to be a useful illumination source for soft x-ray microscopy.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 22, 1992
- Accession Number
- ADP007239
Entities
People
- D. A. Tichenor
- G. D. Kubiak
- M. E. Malinowski
- R. H. Stulen
- S. J. Haney
Organizations
- Sandia National Laboratories