Source Issues Relevant to X-Ray Lithography,

Abstract

Considerations of the various issues relating to radiation sources for x-ray lithography are presented, focusing on two leading candidates-laser-produced plasma and synchrotron radiation sources. Issues to be addressed include power requirements of an x-ray source, deliverable power to wafer for both synchrotrons and laser plasma sources, and the requirement for collection solid angle and conversion efficiency for laser plasma sources. In our analysis, we attempt to bring out the relative merits of the sources and the advances necessary to make them viable for future x-ray lithographic systems.

Document Details

Document Type
Technical Report
Publication Date
May 22, 1992
Accession Number
ADP007241

Entities

People

  • David Attwood
  • Khanh Nguyen
  • T. K. Gustafson

Organizations

  • University of California, Berkeley

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Electromagnetic Radiation
  • Lithography
  • Photolithography
  • Radiation
  • Soft X Rays
  • Synchrotron Radiation
  • Synchrotrons
  • X Ray Lithography
  • X Rays

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Optical Physics and Photonics.
  • Software Engineering.

Technology Areas

  • Directed Energy