XUV Conversion Efficiency in a Low-Intensity KrF Laser Plasma for Projection Lithography,

Abstract

Measurements of XUV conversion efficiency in the 2028OeV range were made on a low intensity (7 x 1 O10 W/ cm2) KrF laser-produced plasma with seven targets of varying Z. Novel mass-limited targets were studied to develop ultra-low debris laser-targets for projection lithography.

Document Details

Document Type
Technical Report
Publication Date
May 22, 1992
Accession Number
ADP007244

Entities

People

  • Glenn D. Kubiak
  • John A. Hunter
  • Paul D. Rockett
  • Richard E. Olson
  • Ron Kensek

Organizations

  • Sandia National Laboratories

Tags

DTIC Thesaurus Topics

  • California
  • Conversion
  • Efficiency
  • Intensity
  • Krypton Fluoride Lasers
  • Laser Targets
  • Lasers
  • Lithography
  • Measurement
  • Photolithography
  • Soft X Rays
  • Targets
  • X Rays

Fields of Study

  • Physics

Readers

  • Pulsed Power and Plasma Physics.

Technology Areas

  • Directed Energy