Multilayers for Soft-X-Ray Optics,

Abstract

Some problems fundamental to the design of soft-x-ray (SXR) multilayers are discussed. This includes an optical criterion for selecting proper material pairs and the critical film thickness needed for a film to become optically isotropic. A laboratory-type spectroreflectometer useful for the evaluation of SXR multilayers is presented with experimental results. For practical interest in SXR projection lithography, preliminary results are also presented on irradiation tests of SXR multilayers and design of a demagnifying Schwarzschild optics for use with synchrotron radiation.

Document Details

Document Type
Technical Report
Publication Date
May 22, 1992
Accession Number
ADP007246

Entities

People

  • Masaki Yamamoto
  • Masato Koike
  • Mihiro Yanagihara
  • Takeshi Namioka

Organizations

  • Tohoku University

Tags

DTIC Thesaurus Topics

  • Absorbers (Materials)
  • Advanced Materials
  • Electromagnetic Radiation
  • Engineered Materials
  • Ionizing Radiation
  • Lithography
  • Materials
  • Metamaterial Absorbers
  • Photolithography
  • Radiation
  • Soft X Rays
  • Synchrotron Radiation
  • X Ray Optics
  • X Rays

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Systems Analysis and Design