Surface-Imaging Lithography,
Abstract
Surface-imaging lithography is a technique which was first described by Taylor et al. 1 nearly ten years ago. In this approach, a pattern is defined at the surface or near-surface regions of a resist rather than throughout the entire resist thickness. Surface-imaging can eliminate problems such as reflectivity variations due to different substrates or topography in optical lithography and backscattering in electron-beam lithography 2. The use of surface-imaging has also proven beneficial for deep-UV optical lithography, where the high absorbance of most resists necessitates such an approach. Resist absorption is also problematic for projection printing with soft x-ray radiation; the 1/e attenuation length ranges from 300 nm for 13.5-nm x-rays to less than 100 nm with 39-nm x-rays 3.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 22, 1992
- Accession Number
- ADP007252
Entities
People
- Mark A. Hartney
Organizations
- Massachusetts Institute of Technology