Propagation of 100-GHz Bandwidth Electrical Pulses on a Silicon-Based Microstrip Line with Buried CoSi sub 2 Groundplane,
Abstract
We present a microstrip line that uses a highly conducting cobalt silicide layer buried 7 micron below the surface of single-crystalline silicon as groundplane. This novel transmission line shows significantly reduced dispersion for electrical pulses of 100 GHz bandwidth compared to a conventional microstrip line with the groundplane on the back of the substrate. The 2.5 ps risetime (10%-90%) of electrical pulses propagating on the line increases to only 3.7 ps after a distance of 5 mm compared to an increase from 2.7 ps to 11.3 ps on a conventional microstrip line.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 22, 1992
- Accession Number
- ADP007661
Entities
People
- Ben Tell
- David W. Kisker
- Hartmut Roskos
- Keith W. Goossen
- Martin C. Nuss