Strained-Layers for Electronics and Optoelectronics,
Abstract
The strain associated with intentionally lattice mismatched (strained-layer) heteroepitaxy provides a novel method for tailoring material band structure to enhance device performance through optimization of material structure. The applications of strained-layer epitaxy to heterojunction transistors and semiconductor lasers are presented.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 22, 1992
- Accession Number
- ADP007675
Entities
People
- David R. Myers
Organizations
- Sandia National Laboratories