Interaction of Low-Energy Electronics with Adsorbed Molecules: Mechanisms of Energy Transfer and Dissociation,
Abstract
The chemical reactivity of molecules physisorbed or chemisorbed on solid surfaces is a topic of interest in many areas of applied physics and chemistry. A large portion of the activity in this field of research has been focused on the catalytic action of surfaces; however, the recent discoveries on the possibility to enhance, trigger and even control chemical reactions with photon and particle beams incident on surfaces are now starting to shift scientific interests toward studies of the dynamics involved in these non-thermal reactions. Particularly, photon and electron beam methods are expected to surpass present macroscopic methods (e.g., plasma etching) in the manufacture of microelectronic and micromechanical devices requiring fine-line lithography . One class of such techniques involves the utilization of laser photons with energies ranging from 0.1 eV in the infrared to 6 eV in the ultraviolet. Many of the laser-driven surface reactions are expected to be caused by the photogeneration of low-energy electrons which transfer energy to an adsorbate causing dissociation and desorption. Low-energy electrons are also expected to play a dominant role in the basic physical and chemical mechanisms involved in microlithography techniques utilizing high-energy radiation such as direct writing with an electron beam and etching with laser- or synchrotrongenerated X-rays.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 22, 1992
- Accession Number
- ADP007907
Entities
People
- Leon Sanche
Organizations
- University of Sherbrooke