Relationship Between Soft X-Ray Reflectance and Structural Parameters of Nanometer-Period Multilayers for X-Ray Mirrors,
Abstract
Multilayers alternating materials at atomic scale have been deposited, using UIIV diode rf sputtering, to be used as soft X-ray mirrors. We have investigated the relationship between the stack performances (reflectivity, selectivity) and the structural characteristics of the stacks. The use of graphite instead of amorphous carbon in Ni/C multilayers results in an increase of the performances as well as cooling the sample during the deposition. A similar effect is observed in W/BN multilayers introducing nitrogen during the growth to saturate the nitride. In the case of Si/SiN stacks, narrow Bragg peaks and a higher reflectivity are obtained annealing the samples up to 800 deg C. At least, a comparison is made between Mo/Si and Co/Si multilayers in order to show the importance of interface compound formation.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 05, 1992
- Accession Number
- ADP008019
Entities
People
- Philippe Houdy
- Pierre Boher