Ray and TEM Analysis of Small Period W-Si and W-B4C Multilayers,

Abstract

In recent reports of the manufacture and characterization of small period multilayers, researchers have utilized high resolution EM and an analysis of Cu-K alpha X-Ray data to interpret and explain variations of reflectivity from theoretical predictions. These theoretical analyses are based on a dynamical reflectivity calculation which incorporates the Debye-Waller factor to simulate layer/interface roughness. Using the same analysis techniques we have evaluated how layer roughness varies with d-spacing and film thickness for small period (15A<d<22A) multilayers.

Document Details

Document Type
Technical Report
Publication Date
Mar 05, 1992
Accession Number
ADP008030

Entities

People

  • James Scholhamer
  • James Wood
  • John Mansfield
  • Kevin Parker

Organizations

  • University of Michigan

Tags

DTIC Thesaurus Topics

  • High Resolution
  • Physical Properties
  • Reflectivity
  • Roughness
  • Surface Properties
  • Thickness
  • X Rays

Readers

  • Computational Modeling and Simulation
  • Materials Science and Engineering.
  • Nanofabrication and Microfabrication.

Technology Areas

  • Space