Simulation of Mixing at Mo/Si Interfaces,
Abstract
Soft x-ray projection lithography is a rapidly emerging technology which will have enormous impact on the microelectronics industry, by providing faithful image reduction to a minimum feature size below 1000 angstroms. X-ray reduction cameras have already been designed and tested, but the successful development of this new technology will depend heavily upon the production of efficient, durable x-ray optics. A leading candidate for x-ray mirrors near 130 angstroms is multilayer structures made of alternating thin layers of Mo and Si. The microstructure of these multilayers has been thoroughly studied, and one of their most important features is an asymmetry in the thicknesses of the interfaces between layers. The interlayers produced by depositing Mo on Si are thicker than those produced by depositing Si on Mo. The ratio of the two interlayer thicknesses can vary from about 1.5 to 4, depending upon the details of the deposition process. As currently envisioned, x-ray lithography will require as many as seven reflections from multilayer mirrors. Therefore, even small improvements in the performance of the mirrors can lead to substantial increases in overall efficiency. Since the sharpness of the interlayers can significantly affect the performance of the multilayer mirror, the mechanisms which determine interlayer thickness are an important area of research.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 05, 1992
- Accession Number
- ADP008037
Entities
People
- D.b. Boercker
- W.l. Morgan
Organizations
- Lawrence Livermore National Laboratory