Thermal Stability of Mo-Based Multilayers Fabricated by rf Sputtering,
Abstract
Mo-based periodic multilayers such as Mo/Si and Mo/B4C show great promise as reflectors for soft x-ray reduction lithography 1-3). The thermal stability of multilayers is one of the most important factors for ensuring the reliable performance. The Mo/Si and Mo/B4C multilayers show high reflectivity in the 8 nm - 15 nm region at normal incidence. The purpose of this paper is to present the resulting changes of layered and 'crystal structures of the Mo/Si and Mo/B4C multilayers upon thermal annealing.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 05, 1992
- Accession Number
- ADP008057
Entities
People
- Hiroo Kinoshita
- Hisataka Takenaka
- Tomoaki Kawamura
- Yoshikazu Ishii
Organizations
- NTT, Inc.