Characterization of Etched Laminar Multilayer Amplitude Gratings in the Soft X-Ray Region,
Abstract
The fabrication of lamellar multilayer gratings has permitted a number of results on the performances of these devices. The results obtained on a 3 micrometer pitch grating patterned electron beam lithography, testbed at 97 eV photon energy are presented. These are compared to a Kinematical lamellar multilayer grating.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 05, 1992
- Accession Number
- ADP008067
Entities
People
- D. Schirmann
- P. Boher
- P. Troussel
- R. Barchewitz
- S. Bac
Organizations
- University of Paris-Sud