Analysis of Electrooptic Device Electrodes: Influence of Metalization Thickness, Substrate Optical Axis Inclination and Buffer Layer,
Abstract
Characterization of the transmission line properties of electrooptic modulators has received considerable attention in recent years. Various analytical and numerical approaches have been applied to solve the boundary value problems involving strip lines on anisotropic substrates. In many cases the effects of the electrode thickness and the general nature of the substrate anisotropy were not considered. Consider the shielded strip line structure shown. The electrodes of thickness t are assumed to reside on a substrate characterized by an arbitrary permittivity tensor. The presented analysis also allows the inclusion of a buffer layer between the anisotropic substrate and the electrodes.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1992
- Accession Number
- ADP008087
Entities
People
- Anand Gopinath
- Marat Davidouite
- R. Pregla
- Zhiqiang Wu
Organizations
- University of Minnesota