Amorphous-Silicon Thin-Film Transistor With Two-Step Exposure Process

Abstract

The two-step-exposure (TSE) technology has been developed in application for combination of the active layer with metal II layer. And this TSE technology has been applied in our Reduced-Mask process (five-mask) for cost reduction. The result shows that this amorphous-silicon thin-film transistor with four-photolithography process has great potential in mass production.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 2000
Accession Number
ADP011322

Entities

People

  • Dou-i Chen
  • Hsixg-ju Sung
  • Jr-hong Chen
  • June-wei Hwang
  • Pi-fu Chen

Tags

DTIC Thesaurus Topics

  • Chemical Reactions
  • Cost Reductions
  • Costs
  • Dry Etching
  • Electrodes
  • Electronics
  • Etching
  • Fabrication
  • Films
  • Manufacturing
  • Mass Production
  • Materials
  • Photolithography
  • Production
  • Thin Film Transistors
  • Thin Films
  • Transistors

Fields of Study

  • Materials science

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