Characterization of the Sb2O3 Thin Films by X-Ray Scattering
Abstract
Thin films of Sb2O3 have been prepared by thermal sputtering on a substrate of SiO2. The X ray scattering experiment from the Sb2O3 films was accomplished using a reflectometer. It consists of an X-ray source, a curbed multilayer monochromator on the incident beam side, a slit in front of the sample mounted on the center of the circle of the goniometer and two slits preceding the detector on a circle of the diffracted beam side. Specular X-ray scattering is sensitive normal to the sample surface. It provides vertical structural structure parameters (the density and roughness of the substrate and the density, thickness and roughness of the Sb2O3 layers on top of the SiO2 substrate). The scanning of the surface was done at an incidence angle of the X-ray is in the range of 0-8 degrees and the reflected intensity was recorded. The specular and diffuse X-ray scattering obtained from the deposed thin films, having different thickness, represent a method that is sensitive to density contrasts and can therefore be applied to all sorts of unpatterned surfaces and layered structures. It is applicable to structures on the nanometer scale and roughnesses on the subnanometer scale. The obtained data have shown that at lest ultrathin Sb2O3 layers reveals a gradated layer structure. The results can be used in controlling of the thin layers fabrication, thickness determination that have to rely upon densities and optical constant of layers.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 2001
- Accession Number
- ADP011562
Entities
People
- C. Gheorghies
- L. Gheorghies
Organizations
- University of Galați