Modelling of Micromachined Klystrons for Terahertz Operation

Abstract

The use of silicon and ultra-thick photoresist micromachining for the fabrication of terahertz frequency klystrons is discussed and a Monte Carlo based model of the device physics is presented. The model is shown to be an accurate representation of the electron flow in the device and it is demonstrated how it can be used as a design tool to optimise the geometry and operating conditions. An estimate of the power levels to be expected by the proposed devices is given.

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Document Details

Document Type
Technical Report
Publication Date
Sep 29, 2000
Accession Number
ADP011739

Entities

People

  • D. P. Steenson
  • J. M. Chamberlain
  • Joan Garcia
  • John R. Fletcher
  • Robert E. Miles

Organizations

  • University of Leeds

Tags

Communities of Interest

  • Energy and Power Technologies
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Cavity Resonators
  • Charge Density
  • Construction
  • Electrical Engineering
  • Electrodes
  • Electromagnetic Fields
  • Electron Beams
  • Electrons
  • Emission
  • Engineering
  • Fabrication
  • Field Effect Transistors
  • Field Emission
  • Klystrons
  • Reflex Klystrons
  • Simulations
  • Terahertz Radiation

Fields of Study

  • Physics

Readers

  • Computational Modeling and Simulation
  • Nanofabrication and Microfabrication.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Microelectromechanical Systems