XRD Strain and Stress Determination in Nanostructured Films and Coatings

Abstract

The residual stress determination of nanostructured films and coatings is reviewed. A method of measuring the depth dependence of the stress profile using energy dispersive x-ray diffraction with a high-energy 'white' beam synchrotron radiation source is presented. The profiling is accomplished with the aid of a highly collimated incident and scattered x-ray beams and with micro positioning of the sample-interface. The depth of the profiling is on the order of mm and the resolution of the profiling is on the order of a few microns. The technique allows the three dimensional profiling of the stress distribution in these materials.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2000
Accession Number
ADP011818

Entities

People

  • Mark. Croft
  • Thomas Tsakalakos

Organizations

  • Rutgers University–New Brunswick

Tags

Communities of Interest

  • Air Platforms
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Coatings
  • Detectors
  • Diffraction
  • Energy
  • Engineering
  • Geometry
  • High Energy
  • High Pressure
  • Materials
  • Materials Engineering
  • Measurement
  • Residual Stress
  • Scattering
  • Stress Corrosion
  • Three Dimensional
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Physics

Readers

  • Oceanography.
  • Powder metallurgy of Titanium alloys.
  • Pulsed Power and Plasma Physics.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene