Effect of Metal Back Contacts on Tetrahedral Amorphous Carbon Films Grown Using the Cathodic Arc Process

Abstract

Reported here is a study on the effect of different metal back contacts on the electrical and structural properties of the tetrahedral amorphous carbon (ta-C). The films were grown using a pulsed cathodic arc system. Ta-C films were deposited simultaneously on silicon substrate, precoated with the following metals, namely aluminium (Al), gold (Au), chromium(Cr), molybdenum (Mo), copper (Cu), tungsten (V) and titanium(T1). The electrical measurements and Raman response show that the back contact does influence the properties of ta-C films. These results are analyzed with respect to our earlier report regarding the influence of back contacts on field emission from similar ta-C films.

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Document Details

Document Type
Technical Report
Publication Date
Apr 01, 2001
Accession Number
ADP012159

Entities

People

  • A. Hiraki
  • B. S. Satyanarayana
  • H. Takahashi
  • T. Narusawa

Organizations

  • Kochi University of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Current Density
  • Electrical Measurement
  • Emission
  • Engineering
  • Field Emission
  • Fullerenes
  • Low Temperature
  • Materials
  • Measurement
  • Metals
  • Raman Spectra
  • Raman Spectroscopy
  • Scattering
  • Spectroscopy
  • Structural Properties
  • Systems Engineering
  • Work Functions

Fields of Study

  • Materials science

Readers

  • Electrochemical Surface Science
  • Powder metallurgy of Titanium alloys.