Field Emission Site Densities of Nanostructured Carbon
Abstract
The field emission properties of nanostructured carbon films deposited by cathodic vacuum arc in a He atmosphere have been studied by measuring the emission currents and the emission site density. The films have an onset field of ^3 V/micrometer. The emission site density is viewed on a phosphor anode and it increases rapidly with applied field. It is assumed that the emission occurs from surface regions with a range of field enhancement factors but with a constant work function. The field enhancement factor is found to have an exponential distribution.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 2001
- Accession Number
- ADP012160
Entities
People
- J. Robertson
- Jingbiao Cui
- W. I. Milne
Organizations
- University of Cambridge