Characterization of the Order-Annealing Response of Nanostructured Iron-Palladium Based Ferromagnetic Thin-Films

Abstract

A combination of XRD and TEM techniques have been used to characterize the response of room temperature magnetron sputtered Fe-Pd thin films on Si-susbtrates to post-deposition order-annealing at temperatures between 400-500 deg C. Deposition produced the disordered Fe-Pd phase with (111)-twinned grains approximately 18 nm in size. Ordering occurred for annealing at 450 deg C and 500 deg C after 1.8 ks, accompanied by grain growth (40-70 nm). The ordered FePd grains contained (111)-twins rather than ?101!-twins typical of bulk ordered FePd. The metallic overlayers and underlayers selected here produced detrimental dissolution (Pt into Fe-Pd phases) and precipitation reactions between Pd and the Si substrate.

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Document Details

Document Type
Technical Report
Publication Date
Nov 01, 2001
Accession Number
ADP012187

Entities

People

  • Adam T. Wise
  • Huiping Xu
  • Jorg M. Wiezorek
  • Timothy J. Klemmer

Organizations

  • University of Pittsburgh

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Crystal Structure
  • Crystals
  • Diffraction
  • Electron Microscopy
  • Films
  • Geometry
  • Grain Growth
  • Grain Size
  • Magnetic Properties
  • Materials
  • Materials Science
  • Nanocomposites
  • Partial Pressure
  • Phase Diagrams
  • Spatial Distribution
  • Thin Films
  • Transmission Electron Microscopy

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene