Stress and Hardness of CrN films

Abstract

Chromium nitride films CrN(x) with x ranging form 0 to 1 were deposited by reactive PVD. Both stress and hardness in the films are a function of the composition. The growth stress and hardness for the majority of the films can be related through the Hall Petch relation. It is shown that the hardest films fall outside this relation. It is also shown that the hardest films are nanocrystalline. It is argued that the hardness of these films is a consequence of the nanocrystallinity of these films.

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Document Details

Document Type
Technical Report
Publication Date
Nov 01, 2001
Accession Number
ADP012195

Entities

People

  • G. C. Janssen
  • J. D. Kamminga
  • W. G. Sloof

Organizations

  • Delft University of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Ball Bearings
  • Crystal Structure
  • Diffraction
  • Grain Boundaries
  • Ion Bombardment
  • Materials
  • Measurement
  • Metals
  • Nanocomposites
  • Netherlands
  • Spectra
  • Stresses
  • Tensile Stress
  • Thermal Stresses
  • X Ray Spectra
  • X Rays
  • X-Ray Diffraction

Readers

  • Powder metallurgy of Titanium alloys.
  • Theoretical Analysis.
  • Thin Film Deposition Science.