Temperature Dependence of the Magnetoresistance of Co/Re Superlattices

Abstract

Hcp (10.0) Co/Re superlattices were grown by dc magnetron sputtering on sapphire (11.0) substrates with the 00.1 direction of the superlattice in the film plane. The temperature-dependent magnetoresistance (MR) was measured on samples patterned by photolithography from 10 K to 300 K in a 5.5 T superconducting magnet. The pattern allows the measurement of the MR with the current (I) and the magnetic field (H) parallel or perpendicular to the magnetic easy axis (c, the 00.1 direction). Measurements at 5 K on an antiferromagnetically-coupled sample shows dips in the MR near H = 0 when H \\ c and H perpendicular to I, dips below the saturation value at H ^ 2.5 kOe for H \\ c and H \\ I configuration due to the competition between the anisotropic magnetoresistance (AMR) and the giant magnetoresistance (GMR). Since the AMR is dependent on the transport within the ferromagnetic layers, the temperature dependence yields information about the relative magnitudes of interface vs. bulk spin-dependent scattering. Our analysis shows that the GMR is anisotropic and that the spin-dependent scattering occurs predominantly at the interfaces only for certain configurations.

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Document Details

Document Type
Technical Report
Publication Date
Apr 01, 2001
Accession Number
ADP012262

Entities

People

  • David Lederman
  • Gian P. Felcher
  • Timothy Charlton

Organizations

  • West Virginia University

Tags

Communities of Interest

  • Air Platforms

DTIC Thesaurus Topics

  • Band Structures
  • Electrical Resistance
  • Electron Scattering
  • Energy Bands
  • Engineered Materials
  • Ferromagnetic Materials
  • Geometry
  • Magnetic Materials
  • Magnetic Properties
  • Magnetoresistance
  • Materials
  • Materials Laboratories
  • Materials Science
  • Quantum Properties
  • Scattering
  • Spin-Orbit Interaction
  • X Rays

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Superconducting Magnet Technology
  • Thin Film Deposition Science.