Magnetostriction and Microstructure of As-Deposited and Annealed Co Thin Films

Abstract

The magnetostriction of as-sputtered and annealed 400 nm thick Co films has been studied in longitudinal and transverse magnetic fields. The appreciable change of the magnetostriction behavior after annealing above 250 deg C is correlated to grain growth and to the related change of the texture (from nearly randomly distributed hcp-Co crystallites to a c-axes texture perpendicular to the film plane). The magnetostriction behavior in the annealed samples cannot be explained by a domain magnetization within the film plane. It is assumed that a rotation of the spontaneous magnetization out of the film plane occurs due to the development of a perpendicular magnetic anisotropy.

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Document Details

Document Type
Technical Report
Publication Date
Apr 01, 2001
Accession Number
ADP012272

Entities

People

  • Claus M Schneider
  • Detlev Tietjen
  • Juergen Thomas
  • Michael Hecker
  • Winfried Brueckner

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Annealing
  • Elastic Properties
  • Electron Microscopy
  • Equations
  • Films
  • Grain Growth
  • Heat Treatment
  • Magnetic Fields
  • Materials
  • Measurement
  • Mechanical Properties
  • Microstructure
  • Modulus Of Elasticity
  • Optical Materials
  • Stresses
  • Thin Films
  • Transmission Electron Microscopy

Readers

  • Plasma Physics / Magnetohydrodynamics
  • Powder metallurgy of Titanium alloys.
  • Thin Film Deposition Science.