Atomic Fluorine Source for Chemical Lasers
Abstract
We present results from the early development of an F atom source appropriate for HF and AGIL chemical laser research. The system uses high power microwaves to produce a high enthalpy plasma that thermally dissociates molecular species such as SF6 and F2. Results of the characterization of the flow are presented.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 24, 2002
- Accession Number
- ADP012393
Entities
People
- A. H. Gelb
- D. B. Oakes
- M. E. Read
- S. J. Davis
Organizations
- Physical Sciences (United States)