Fabrication of Metallic Nanostructures by Local Oxidation with a Scanning Probe Microscope
Abstract
Surfaces can be oxidized with the tip of a scanning probe microscope when applying a voltage between surface and tip. The oxidation process is voltage and humidity dependent, and can be explained in terms of anodic oxidation. The local oxidation allows the nanoscale patterning of doped silicon wafers as wll as of metal films. In the case of silicon, the thin oxide layer can serve as an effective mask in a wet etching step. Sufficiently thin metal films (e.g., Ti or Al) can be completely oxidized down to the substrate, enabling the direct writing of nanostructures.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1998
- Accession Number
- ADP012736
Entities
People
- C. V. Haesendonck
- M. Ahlskog
- R. J. Vullers
Organizations
- Katholieke Universiteit Leuven - Universiteitsarchief