Steps Towards the Realization of Novel Prototype Functional Devices Using Scanning Probe Microscopy

Abstract

Moore's principle predicts that beyond the year 2010 the typical structure dimensions of electronic memory devices will fall below 70 nm. Apart from the necessity to develop suitable lithographic techniques for mass production of sub 100 nm features, the sole reduction of the structure dimensions (top down approach), while maintaining the present day device architecture, will result in physical obstacles, making the invention of novel designs for future devices indispensable. It what follows, we report on novel concepts for the fabrication of a single-electron transistor (SET) and a quantum interference transistor (QUIT), respectively

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Document Details

Document Type
Technical Report
Publication Date
Jun 01, 1998
Accession Number
ADP012737

Entities

People

  • E. Hartmann
  • L. Samuelson
  • M. Schwartzkopff
  • P. Radojkovic
  • T. Junno

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Electrical Properties
  • Electrodes
  • Electron Beam Lithography
  • Electron Beams
  • Electron Gas
  • Electrons
  • Fabrication
  • Low Temperature
  • Mass Production
  • Materials
  • Metallic Nanoparticles
  • Microscopy
  • Nanoparticles
  • Nanostructures
  • Particles
  • Scanning
  • Transistors

Fields of Study

  • Physics

Readers

  • Computational Modeling and Simulation
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Quantum Computing