Atomic Force Microscopy Characterization of Nanostructured Materials Using Selective Chemical Etching
Abstract
Atomic force microscopy and selective chemical etching were used to estimate the shape and sizes of the buried alpha-Fe nanoparticles created by ion bombardment in silica glasses. In situ and ex situ AFM measurements were performed. New data about distribution of nanoparticles and radian on induced defects both in a plane and on depth were obtained by these methods.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 18, 1999
- Accession Number
- ADP012914
Entities
People
- A. A. Bukharaev
- A. A. Mozhanova
- D. V. Ovchinnikov
- N. I. Nurgazizov
Organizations
- Russian Academy of Sciences