Growth of Self-Assembled GeSi Islands with Narrow Size Distribution on Si (001)
Abstract
The results of the investigation of the self-assembled Ge islands growth on Si (001) at 700 C are presented. The evolution of the islands shape from hut to dome islands is studied. For Ge coverage of 11 monolayers a narrow distribution of islands sizes is obtained which allowed to use the Raman spectroscopy and X-ray diffraction for determination of Ge content and residual strain in islands.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 18, 1999
- Accession Number
- ADP012982
Entities
People
- A. V. Novikov
- I. V. Dolgov
- N. V. Vostokov
- Y. N. Drozdov
- Z. F. Krasil'nik
Organizations
- Russian Academy of Sciences