Argon Plasma Etching of Gallium Nitride: Spectroscopic Surprises

Abstract

It is shown that bulk reactive-ion-etched MOVPE-grown GaN can exhibit dramatically increased near-band-edge and below-band-gap emission when compared with unetched samples. A detailed spectroscopic study reveals firstly that donor bound excitons are the dominant species in the near-band-edge emission and secondly that previous models of the yellow luminescence band must be revised due to the clear linkage between the yellow emission and a little studied blue emission band, UV illumination on over a period of time enhances the yellow emission by a factor of 20 at room temperature, and it is shown that this effect can be employed for optical data storage and retrieval.

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Document Details

Document Type
Technical Report
Publication Date
Jun 23, 2000
Accession Number
ADP013056

Entities

People

  • C. Kirchner
  • M. Kamp
  • R. Cheung
  • R. J. Reeves
  • Steven A. Brown

Organizations

  • University of Canterbury

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms

DTIC Thesaurus Topics

  • Argon Lasers
  • Band Gaps
  • Chemical Etching
  • Compound Semiconductors
  • Data Storage Systems
  • Emission
  • Energy Bands
  • Etching
  • Fabrication
  • Gallium Nitrides
  • Intensity
  • Ion Lasers
  • Laser Beams
  • Lasers
  • Low Temperature
  • Luminescence
  • Materials

Fields of Study

  • Materials science

Readers

  • Chemistry (specifically Chemical Fluorescence)
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene