Spectroscopy of Inhomogeneous Strain in Silicon-Based Quantum Dots
Abstract
Resonant tunneling is employed to probe the inhomogeneous strain in silicon-based quantum dots. When submicron structures are etched from a p-Si/SiGe/Si double-barrier heterostructure, the resonant I (V) peaks shift and develop a fine structure consistent with pronounced strain relaxation in the SiGe quantum well. We calculate the strain dependence on dot size by finite element techniques and convert the strain to an effective lateral confining potential. by sufficiently small dots, we find that the inhomogeneous strain confines carriers not only to the central core. as in GaAs-based dots, but also to a ring-like region at the perimeter. We probe the resulting density of states by magnetotunneling I (V, B) measurements.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 23, 2000
- Accession Number
- ADP013120
Entities
People
- A. Zaslavsky
- B. R. Perkins
- Jun Liu
- Lambert Ben Freund
Organizations
- Brown University