Indium Distribution in Pseudomorphic InGaAs/(Al)GaAs Quantum Wells Grown by MOCVD
Abstract
Indium atom distribution in InGaAs/(Al)GaAs quantum wells (QWs) grown by metal organic chemical vapor deposition (MOCVD) was systematically studied. High resolution grazing sputter angle Auger electron spectroscopy was used as a method of indium depth profile investigation. Broadening and shift to the surface ofindium concentration profile in single QW the increase of indium content in upper quantum well for close spaced QWs were found. It was observed that the use of AlGaAs barriers between QWs reduces indium surface segregation.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 2001
- Accession Number
- ADP013164
Entities
People
- A. A. Marmalyuk
- A. A. Padalitsa
- A. V. Petrovsky
- D. B. Nitikin
- O. I. Govorkov