Development of Parallel Dip Pen Nanolithography Probe Arrays for High Throughput Nanolithography

Abstract

Dip Pen Nanolithography (DPN) is a lithographic technique that allows direct deposition of chemicals, metals, biological macromolecules, and other molecular 'inks' with nanometer dimensions and precision. This paper addresses recent developments in the design and demonstration of high-density multiprobe DPN arrays. High-density arrays increase the process throughput over individual atomic force microscope (AFM) probes and are easier to use than arrays of undiced commercial probes. We have demonstrated passive arrays made of silicon (8 probes, 310 micrometers tip-to-tip spacing) and silicon nitride (32 probes, 100 micrometer tip-to-tip spacing). We have also demonstrated silicon nitride 'active' arrays (10 probes, 100 micrometer tip-to-tip spacing) that have embedded thermal actuators for individual probe control. An optimization model for these devices, based on a generalized multilayer thermal actuator, is also described.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Apr 01, 2003
Accession Number
ADP014228

Entities

People

  • Chang Liu
  • David A. Bullen
  • Jun Zou
  • Sung-wook Chung
  • Xuefeng Wang

Organizations

  • University of Illinois Urbana–Champaign

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Actuators
  • Adhesion
  • Ceramic Materials
  • Chemistry
  • Etching
  • Fabrication
  • Films
  • Geometry
  • High Density
  • Lithography
  • Materials
  • Mechanics
  • Modulus Of Elasticity
  • Nanolithography
  • Simulations
  • Thermal Expansion
  • Thickness

Fields of Study

  • Physics

Readers

  • Fluid Dynamics.
  • Nanofabrication and Microfabrication.
  • Spectroscopy.

Technology Areas

  • Space
  • Space - Hall-Effect Thruster