Plasma Processing of Materials at the Atomic Scale

Abstract

Plasma etching is finding new applications beyond the microelectronics industry. There are new challenges in the devising and controlling of plasma-surface interactions.

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Document Details

Document Type
Technical Report
Publication Date
Jul 20, 2003
Accession Number
ADP014941

Entities

People

  • N. St. J. Braithwaite
  • T. Matsuura

Organizations

  • The Open University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Artificial Intelligence
  • Electric Power
  • Electromechanical Devices
  • Electron Energy
  • Energy
  • Fabrication
  • Genetic Algorithms
  • Ion Bombardment
  • Materials
  • Microelectromechanical Systems
  • Microelectronics
  • Polymeric Films
  • Polymers
  • Space Charge
  • Surface Reactions
  • Technical Information Centers
  • Three Dimensional

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene