Practical Plasma Immersion Ion Implantation for Stress Regulation Treatment of Insulators and Complex Shapes

Abstract

Plasma immersion ion implantation has been attracting the interest of research groups around the world over the last two decades. The technique has been developed to the stage where it is a well-established technique for a number of materials processing applications, such as plasma nitriding. Recent research has focused on developing the method for a range of new applications, including stress regulation, surface treatment of insulators and complex shaped work pieces. The state of development of these new and technologically important applications will be discussed in this paper.

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Document Details

Document Type
Technical Report
Publication Date
Jul 20, 2003
Accession Number
ADP014942

Entities

People

  • D. R. Mckenzie
  • D. T. Kwok
  • M. M. M. Bilek
  • R. N. Tarrant
  • T. W. H. Oates

Organizations

  • University of Sydney

Tags

Communities of Interest

  • Advanced Electronics
  • Biomedical

DTIC Thesaurus Topics

  • Collapse
  • Dielectric Properties
  • Dielectrics
  • Energy
  • Films
  • High Voltage
  • Implantation
  • Ion Implantation
  • Ionized Gases
  • Ions
  • Langmuir Probes
  • Materials
  • Materials Processing
  • Physics
  • Plasma Sheaths
  • Surface Finishing
  • Thin Films

Readers

  • Cardiovascular Physiology
  • Economics
  • Powder metallurgy of Titanium alloys.

Technology Areas

  • Microelectronics