Programming of Graphene Properties via Defect Design and Characterization
Abstract
Edge-defects in patterned graphene play an important role in determining its physical and chemical properties. However, conventional graphene patterning via lithography and etching causes C atoms at the edges to become disordered and contaminated with residues and thus lose the intrinsic properties of the defects. Here, programming of graphene properties via defect design and functionalization is proposed on the basis of high-quality nano-patterned graphene with disordering, yet with contamination-free edges and a near-single crystal structure.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Aug 28, 2018
- Source ID
- FA23861814110
Entities
People
- Won Park
Organizations
- Air Force Office of Scientific Research
- United States Air Force