Identification of atomic scale mechanisms active in resistance switching devices by atom probe tomography

Abstract

Investigate atomic scale mechanisms responsible for resistance switching in Ni/HfO2/Cu metal-insulator-metal structures.

Document Details

Document Type
DoD Grant Award
Publication Date
Mar 23, 2016
Source ID
FA95501510176

Entities

People

  • Jochen M. Schneider

Organizations

  • Air Force Office of Scientific Research
  • RWTH Aachen University
  • United States Air Force

Tags

Fields of Study

  • Physics

Readers

  • Ocean-Atmosphere Mesoscale Modeling, Data Assimilation, and Flux Boundary Layers
  • Seismology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene