Group-IV Photonic-Materials by Molecular Beam Epitaxy
Abstract
The prime objective of this work is to learn how to epitaxially grow high quality SiGeSn optoelectronic material. Secondary objectives include improving the understanding of the physics of large adatom segregation during epitaxial growth and how to maintain incorporation. Additionally, prototype optoelectronic devices will be made out of the fabricated materials.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Mar 23, 2016
- Source ID
- FA95501510417
Entities
People
- Thomas E. Vandervelde
Organizations
- Air Force Office of Scientific Research
- Tufts University
- United States Air Force