Electron Beam And Magnetron Sputtering System For Novel Metal/Semiconductor Photocatalysts
Abstract
This proposal is for the acquisition of an Electron Beam and Magnetron Sputtering System that will permit controlled deposition to build devices and structures in a cleanroom facility. This uniques system will be utilized for producing conducting metal oxide films, depositing low work function materials, reactive sputtering and reactive e-beam deposition, and depositing materials at low temperatures.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Dec 05, 2016
- Source ID
- FA95501610374
Entities
People
- Stephen B Cronin
Organizations
- Air Force Office of Scientific Research
- United States Air Force
- University of Southern California