Investigation of Scalability and Reliability of Contacts to Two Dimensional Layered Semiconductors

Abstract

For two-dimensional (2D) semiconductors, elimination of Fermi level pinning is essential to realize low-resistance, scalable, and reliable contacts. In this project, we aim to achieve the same through metal-2D interface engineering (use of an ultra-thin and insulating h-BN layer of optimumthickness between the metal and the 2D-semiconductor) and metal-2D hybridization engineering (use of high pressure). We will characterize the metal-2D contacts under extreme operatingconditions, which includes radiation exposure and high temperatures since these are essential requirements for defense electronic devices.

Document Details

Document Type
DoD Grant Award
Publication Date
Feb 06, 2017
Source ID
FA95501710018

Entities

People

  • Saptarshi Das

Organizations

  • Air Force Office of Scientific Research
  • Pennsylvania State University
  • United States Air Force

Tags

Readers

  • Distributed Systems and Data Platform Development
  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene