Cubic Boron Nitride: A New Extreme Semiconductor by Ion beam Assisted Chemical Vapor Deposition

Abstract

We propose to investigate ultra wide bandgap (UWBG) cubic boron nitride (c BN) for extreme applications such as high voltage power electronics, and radiation detection. Both n type and p type polarity conduction are required to fully realize the full potential of this indirect gap semiconductor. Many UWBG materials suffer from the limitation that either one, or both polarities of dopant levels are too deep to be practical in real power electronics, which require high current levels. Prior work on non optimized samples indicates that shallow n type (Si doping), and p type (Beryllium doping) are possible in c BN, making it a unique outlier among the UWBG’s. In this work, we will investigate doping and compensation strategies to evaluate the promise as well as measure the basic physical-electronic properties of c BN, such as mobility and critical breakdown field as a function of the defect morphology. This work will involve both single crystals and in house grown thin films.

Document Details

Document Type
DoD Grant Award
Publication Date
Jan 14, 2022
Source ID
FA95501910122

Entities

People

  • Michael Spencer

Organizations

  • Air Force Office of Scientific Research
  • Morgan State University
  • United States Air Force

Tags

Fields of Study

  • Materials science

Readers

  • Electrical Engineering
  • Solar Photovoltaics and Thermoelectric Devices.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene