Chemical Vapor Deposition System for Research on Gallium-Oxide and Related Semiconductors
Abstract
Investigators at Carnegie Mellon University propose to purchase a chemical vapor deposition (CVD) system that will be used for advanced research on gallium-oxide (Ga2O3) and related semiconductors. The CVD system described in this proposal has proven capability for producing crystalline (epitaxial) films of ?-Ga2O3, in addition to other phases (? and ?) of Ga2O3, indiumgallium-oxide [(InxGa1-x)2O3] and aluminum-gallium-oxide [(AlxGa1-x)2O3] alloy films. The epitaxial films that will be produced using this CVD system will be used in research projects that are highly relevant to the mission and scientific programs of the Department of Defense (DoD), especially the Air Force Office of Scientific Research (AFOSR). The research is specifically targeted towards the AFOSR research topic on Aerospace Materials for Extreme Environments (Program Manager, Dr. Ali Sayir). The gallium oxide and related semiconductors that will be produced using this equipment exhibit superior electronic and other physical properties needed for ultra-high efficiency electronics that can operate under extreme conditions (e.g., high temperature, high power, high frequency, and radiation exposure). Therefore, the research resulting from this program will enable transformative advances in future U.S. Air Force aerospace technologies. The CVD system will directly enhance the quality of a current AFOSR funded research program focused on electrical (ohmic and rectifying) contacts with enhanced thermal stability for use in Ga2O3-based electronic devices for extreme environments. It will also support research by collaborators at institutions such as the Air Force Research Laboratory (AFRL), Carnegie Mellon University (CMU) and University of Texas at El Paso (UTEP). Student exchanges with the latter, minority-serving institution occurring as part of the AFOSR joint research program between CMU and UTEP will provide additional opportunities to educate and train a more diverse student population on CVD processing, an advanced technology widely used in the semiconductor industry. In total, the proposed CVD system would support > $5M of funded research on gallium oxide and related semiconductors. It would also serve as a platform for future research collaborations, for which CVD will be used to grow and characterize films of Ga2O3 and (InxGa1-x)2O3 and (AlxGa1-x)2O3 alloys for other investigators in universities and government laboratories. Research support for industry, through e.g., SBIR/STTR programs, would also result from fundamental studies of CVD film growth of these materials.
Document Details
- Document Type
- DoD Grant Award
- Publication Date
- Aug 12, 2021
- Source ID
- FA95502010304
Entities
People
- Lisa M. Porter
Organizations
- Air Force Office of Scientific Research
- Carnegie Mellon University
- United States Air Force